Patents

  1. B. Wendler, I. Progalskiy, J. Dora, C. Siemers, W. Pawlak, A. Rylski, M. Makówka, P. Nolbrzak, K. Włodarczyk: Generation of high density impulse plasma for cleaning substrates and coatings deposition. Patent application No. P-391523 submitted to the  Polish Patent Office 15.06.2010.
  2. W. Pawlak, B. Wendler,   R.  Atraszkiewicz,   P.  Nolbrzak, K. Włodarczyk, M. Makówka: Synthesis of low friction coating with improved adhesion to steel and cast iron substrates?. Patent application No. P-392508 submitted to the Polish Patent Office 27.09.2010.
  3. B. Wendler, Ł. Kaczmarek, M. Jachowicz, A. Rylski, W. Pawlak: Protective coating for articles made from metal alloys, especially for articles made from titanium-aluminium alloys.   Polish Patent P-370053 (2009).
  4. B. Wendler and K. Jakubowski: Method of Deposition of Hard Coatings onto any Solid Substrate. Patent PL-170157 B1 (1996).
  5. B. Wendler, K. Jakubowski, Z. Has: Method of Creation of Hard Coatings on Steel Articles. Patent PL-167632 B1 (1995).
  6. B. Wendler, Z. Has: Apparatus for Deposition of Thin Ceramic and/or Metallic Layers onto any Solid. Patent PL-143823 (1989).
  7. Z. Has, S. Mitura and B. Wendler: Method of Deposition of Diamondlike Carbon Layers onto any Solid, in particular onto Glass, Quartz, Semiconductors and Metals?. Patent PL-135759 (1989).
  8. B. Wendler, Z. Has and S. Mitura: Method of Creation of Thin Ceramic and/or Metallic Layers and Apparatus for Deposition of Thin Ceramic and/or Metallic Layers onto any Solid. Patent PL-135130 (1988).
  9. B. Wendler, Z. Has, S. Mitura.: Method of Adhesion Betterment of Plastics with low Adhesion Coefficient. Patent PL-133772 (1988).

 Permanent

 

 

Professor Bogdan G. WENDLER, D. Sc., Ph. D.

Lodz University of Technology

Institute of Materials Science and Engineering (I-7)

Coatings' Engineering Division

Stefanowskiego St. 1/15

90924 Lodz, POLAND

tel: + 48 42 631 22 65

fax: + 48 42 636 67 90

email: This email address is being protected from spambots. You need JavaScript enabled to view it.

 

 

 

 

Ph.D. Eng. Adam Rylski

tel: + 48 42 631 22 68

email: This email address is being protected from spambots. You need JavaScript enabled to view it.

 

 

 

Ph. D. Eng. Wojciech Pawlak

email: This email address is being protected from spambots. You need JavaScript enabled to view it.

 

 

 

 

 

 

 

Ph.D Students

 

 

 

 

 

 
 

 

M.Sc. Eng. Marcin Makowka

email: This email address is being protected from spambots. You need JavaScript enabled to view it.

 

 

M.Sc. Eng. Katarzyna Wlodarczyk

 

 

 

 

M.Sc. Eng. Piotr Nolbrzak

 

 

 

 

M.Sc. Eng. Ivan Progalsky

 

 

 

M.Sc. Eng. Massimo Lorusso

 

 

 

 

 Equipment

 

1. Reactive Magnetron Sputtering: B901

2. Cathodic Arc Evaporation: URM 079

3. Reactive Magnetron Sputtering: SP2000

4. Reactive Magnetron Sputtering: Maciapunga:)

5. Diffusion Treatments: Vacuum Furnaces

6. Thermogravimetry: Furnace with Microbalance

7. High Temperature Tribometer

8. Basic Investigation Equipment

 

 

1. Reactive Magnetron Sputtering: B901

 

 

Sample holder

Rotary, with one degree of freedom

Residual pressure

10-4 Pa

Chamber equipment

4 independent magnetron sputtering sources
(max. power 10 kW each)

Gas supply

Inert

Ar

Reactive

N2, C2H2, O2, CH4

Sample cleaning method

Glow discharge under reduced pressure in Ar atmosphere

Sample bias

0 - 400V

Other

Specimen heating up to 473K

 

 

 

2. Cathodic Arc Evaporation: URM 079

 

 

Sample holder

Rotary, with two degrees of freedom
(60 independent axis for samples)

Residual pressure

10-4 Pa

Chamber equipment

2 continuous arc sources of metal plasma
(arc current up to 180 A)

2 pulsed arc sources of carbon plasma
(mean power of the carbon arc discharge 1 kW)

1 magnetron sputtering source (max. power 10 kW)

Gas supply

Inert

Ar

Reactive

N2, C2H2, O2, CH4

Sample cleaning method

4 Ar ion beams
(max. Ar ion energy - 4keV each,
without specimen bias)

Me ions from arc evaporators

Sample bias

High: 800 - 2500V

Low: 0 - 200V

Other

Specimen heating up to 723K

 

 

 

3. Reactive Magnetron Sputtering: SP2000

 

 

Residual pressure

10-4 Pa

Chamber equipment

4 linear magnetron sputtering sources (max. power 15 kW)

Gas supply

Inert

Ar

Reactive

N2, C2H2, O2, CH4

Sample cleaning method

Glow discharge under reduced pressure in Ar atmosphere

Sample bias

0 - 400V

 

 

 

4. Reactive Magnetron Sputtering for powders: Maciapunga:)

 

Sample holders

1. Rotary, with one degree of freedom

2. Specialised rotary holder for powders or particles to coat

Residual pressure

10-4 Pa

Chamber equipment

4 independent magnetron sputtering sources
(max. power density - 50W/cm2)

Gas supply

Inert

Ar

Reactive

N2, C2H2, O2, CH4, H2

Sample cleaning method

Glow discharge under reduced pressure in Ar atmosphere

Sample bias

0 - 600V

Other

Specimens heating up to 773K

 

5. Diffusion Treatments: Vacuum Furnaces

 

 

Quartz tube inner diameter

80 mm or 110 mm

Residual pressure

10-3 Pa

Max. temperature

1473K

Gas supply

Inert

Ar

Reactive

N2, C2H2, O2, CH4

Additional equipment

Glow discharge supply for plasma treatment of specimen surface

 

 

 

 

6. Thermogravimetry: Furnace with Balance

 

Balance precision

10-5 g

Maximum operating temperature

1473K

Maximum specimen dimensions

up to 13mmx13mm

Other

Continuous aquisition by PC

 

 

 

7. CSM High Temperature Tribometer

Contact pair type

Pin-on-disc, ball-on-disc

Minimum load force 1N

Maximum load force

60N

Maximum samples dimensions

Diameter up to 55mm (typically 25,4mm)

Height: up to 10mm (typically 6mm)

Maximum temperature of friction tests

1000°C

Diameter of ball up to 7mm (typically 1/4'' or 1/8'')
Available balls' materials Si3N4, WC, Al2O3, ZrO2, 100Cr6 steel

Other

Tribological tests can be performed in liquid up to 300°C

Controlled and regulated relative humidity

 

 

8. Basic Invesigation Equipment

 

Olimpus Optical Microscope

Calotester

Interference Microscope

 

 

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