Equipment
1. Reactive Magnetron Sputtering: B901
2. Cathodic Arc Evaporation: URM 079
3. Reactive Magnetron Sputtering: SP2000
4. Reactive Magnetron Sputtering: Maciapunga:)
5. Diffusion Treatments: Vacuum Furnaces
6. Thermogravimetry: Furnace with Microbalance
7. High Temperature Tribometer
8. Basic Investigation Equipment
1. Reactive Magnetron Sputtering: B901
Sample holder |
Rotary, with one degree of freedom |
|
Residual pressure |
10-4 Pa |
|
Chamber equipment |
4 independent magnetron sputtering sources |
|
Gas supply |
Inert |
Ar |
Reactive |
N2, C2H2, O2, CH4 |
|
Sample cleaning method |
Glow discharge under reduced pressure in Ar atmosphere |
|
Sample bias |
0 - 400V |
|
Other |
Specimen heating up to 473K |
2. Cathodic Arc Evaporation: URM 079
Sample holder |
Rotary, with two degrees of freedom |
|
Residual pressure |
10-4 Pa |
|
Chamber equipment |
2 continuous arc sources of metal plasma 2 pulsed arc sources of carbon plasma 1 magnetron sputtering source (max. power 10 kW) |
|
Gas supply |
Inert |
Ar |
Reactive |
N2, C2H2, O2, CH4 |
|
Sample cleaning method |
4 Ar ion beams Me ions from arc evaporators |
|
Sample bias |
High: 800 - 2500V Low: 0 - 200V |
|
Other |
Specimen heating up to 723K |
3. Reactive Magnetron Sputtering: SP2000
Residual pressure |
10-4 Pa |
|
Chamber equipment |
4 linear magnetron sputtering sources (max. power 15 kW) |
|
Gas supply |
Inert |
Ar |
Reactive |
N2, C2H2, O2, CH4 |
|
Sample cleaning method |
Glow discharge under reduced pressure in Ar atmosphere |
|
Sample bias |
0 - 400V |
4. Reactive Magnetron Sputtering for powders: Maciapunga:)
Sample holders |
1. Rotary, with one degree of freedom 2. Specialised rotary holder for powders or particles to coat |
|
Residual pressure |
10-4 Pa |
|
Chamber equipment |
4 independent magnetron sputtering sources |
|
Gas supply |
Inert |
Ar |
Reactive |
N2, C2H2, O2, CH4, H2 |
|
Sample cleaning method |
Glow discharge under reduced pressure in Ar atmosphere |
|
Sample bias |
0 - 600V |
|
Other |
Specimens heating up to 773K |
5. Diffusion Treatments: Vacuum Furnaces
Quartz tube inner diameter |
80 mm or 110 mm |
|
Residual pressure |
10-3 Pa |
|
Max. temperature |
1473K |
|
Gas supply |
Inert |
Ar |
Reactive |
N2, C2H2, O2, CH4 |
|
Additional equipment |
Glow discharge supply for plasma treatment of specimen surface |
6. Thermogravimetry: Furnace with Balance
Balance precision |
10-5 g |
|
Maximum operating temperature |
1473K |
|
Maximum specimen dimensions |
up to 13mmx13mm |
|
Other |
Continuous aquisition by PC |
7. CSM High Temperature Tribometer
Contact pair type |
Pin-on-disc, ball-on-disc |
|
Minimum load force | 1N | |
Maximum load force |
60N | |
Maximum samples dimensions |
Diameter up to 55mm (typically 25,4mm) Height: up to 10mm (typically 6mm) |
|
Maximum temperature of friction tests |
1000°C |
|
Diameter of ball | up to 7mm (typically 1/4'' or 1/8'') | |
Available balls' materials | Si3N4, WC, Al2O3, ZrO2, 100Cr6 steel | |
Other |
Tribological tests can be performed in liquid up to 300°C Controlled and regulated relative humidity |
8. Basic Invesigation Equipment
|
Olimpus Optical Microscope |
Calotester |
|
|
Interference Microscope |