Equipment

Equipment

1. Reactive Magnetron Sputtering: B901

2. Cathodic Arc Evaporation: URM 079

3. Reactive Magnetron Sputtering: SP2000

4. Reactive Magnetron Sputtering: Maciapunga:)

5. Diffusion Treatments: Vacuum Furnaces

6. Thermogravimetry: Furnace with Microbalance

7. High Temperature Tribometer

8. Basic Investigation Equipment

1. Reactive Magnetron Sputtering: B901

Sample holder		Rotary, with one degree of freedom
Residual pressure		10-4 Pa
Chamber equipment		4 independent magnetron sputtering sources (max. power 10 kW each)
Gas supply	Inert	Ar
	Reactive	N2, C2H2, O2, CH4
Sample cleaning method		Glow discharge under reduced pressure in Ar atmosphere
Sample bias		0 - 400V
Other		Specimen heating up to 473K

2. Cathodic Arc Evaporation: URM 079

Sample holder		Rotary, with two degrees of freedom (60 independent axis for samples)
Residual pressure		10-4 Pa
Chamber equipment		2 continuous arc sources of metal plasma (arc current up to 180 A) 2 pulsed arc sources of carbon plasma (mean power of the carbon arc discharge 1 kW) 1 magnetron sputtering source (max. power 10 kW)
Gas supply	Inert	Ar
	Reactive	N2, C2H2, O2, CH4
Sample cleaning method		4 Ar ion beams (max. Ar ion energy - 4keV each, without specimen bias) Me ions from arc evaporators
Sample bias		High: 800 - 2500V Low: 0 - 200V
Other		Specimen heating up to 723K

3. Reactive Magnetron Sputtering: SP2000

Residual pressure		10-4 Pa
Chamber equipment		4 linear magnetron sputtering sources (max. power 15 kW)
Gas supply	Inert	Ar
	Reactive	N2, C2H2, O2, CH4
Sample cleaning method		Glow discharge under reduced pressure in Ar atmosphere
Sample bias		0 - 400V

4. Reactive Magnetron Sputtering for powders: Maciapunga:)

Sample holders		1. Rotary, with one degree of freedom 2. Specialised rotary holder for powders or particles to coat
Residual pressure		10^-4 Pa
Chamber equipment		4 independent magnetron sputtering sources (max. power density - 50W/cm2)
Gas supply	Inert	Ar
	Reactive	N2, C2H2, O2, CH4, H2
Sample cleaning method		Glow discharge under reduced pressure in Ar atmosphere
Sample bias		0 - 600V
Other		Specimens heating up to 773K

5. Diffusion Treatments: Vacuum Furnaces

Quartz tube inner diameter		80 mm or 110 mm
Residual pressure		10-3 Pa
Max. temperature		1473K
Gas supply	Inert	Ar
	Reactive	N2, C2H2, O2, CH4
Additional equipment		Glow discharge supply for plasma treatment of specimen surface

6. Thermogravimetry: Furnace with Balance

Balance precision		10-5 g
Maximum operating temperature		1473K
Maximum specimen dimensions		up to 13mmx13mm
Other		Continuous aquisition by PC

7. CSM High Temperature Tribometer

Contact pair type		Pin-on-disc, ball-on-disc
Minimum load force		1N
Maximum load force		60N
Maximum samples dimensions		Diameter up to 55mm (typically 25,4mm) Height: up to 10mm (typically 6mm)
Maximum temperature of friction tests		1000°C
Diameter of ball		up to 7mm (typically 1/4'' or 1/8'')
Available balls' materials		Si3N4, WC, Al2O3, ZrO2, 100Cr6 steel
Other		Tribological tests can be performed in liquid up to 300°C Controlled and regulated relative humidity

8. Basic Invesigation Equipment